Strained-silicon cmos device and method

ABSTRACT

The present invention provides a semiconductor device and a method of forming thereof, in which a uniaxial strain is produced in the device channel of the semiconductor device. The uniaxial strain may be in tension or in compression and is in a direction parallel to the device channel. The uniaxial strain can be produced in a biaxially strained substrate surface by strain inducing liners, strain inducing wells or a combination thereof. The uniaxial strain may be produced in a relaxed substrate by the combination of strain inducing wells and a strain inducing liner. The present invention also provides a means for increasing biaxial strain with strain inducing isolation regions. The present invention further provides CMOS devices in which the device regions of the CMOS substrate may be independently processed to provide uniaxially strained semiconducting surfaces in compression or tension.

RELATED APPLICATION

This application is a divisional of U.S. application Ser. No. 11/619,511filed on Jan. 3, 2007, which is a divisional of U.S. application Ser.No. 10/930,404 filed Aug. 31, 2004, now U.S. Pat. No. 7,227,205 issuedon Jun. 5, 2007.

CROSS REFERENCE TO RELATED APPLICATION

The present invention claims benefit of U.S. provisional patentapplication 60/582,678 filed Jun. 24, 2004, the entire content anddisclosure of which is incorporated by reference.

FIELD OF THE INVENTION

The present invention relates to semiconductor devices having enhancedelectron and hole mobilities, and more particularly, to semiconductordevices that include a silicon (Si)-containing layer having enhancedelectron and hole mobilities. The present invention also providesmethods for forming such semiconductor devices.

BACKGROUND OF THE INVENTION

For more than three decades, the continued miniaturization of siliconmetal oxide semiconductor field effect transistors (MOSFETs) has driventhe worldwide semiconductor industry. Various showstoppers to continuedscaling have been predicated for decades, but a history of innovationhas sustained Moore's Law in spite of many challenges. However, thereare growing signs today that metal oxide semiconductor transistors arebeginning to reach their traditional scaling limits. A concise summaryof near-term and long-term challenges to continued complementary metaloxide semiconductor (CMOS) scaling can be found in the “GrandChallenges” section of the 2002 Update of the International TechnologyRoadmap for Semiconductors (ITRS). A very thorough review of the device,material, circuit, and systems can be found in Proc. IEEE, Vol. 89, No.3, March 2001, a special issue dedicated to the limits of semiconductortechnology.

Since it has become increasingly difficult to improve MOSFETs andtherefore CMOS performance through continued scaling, methods forimproving performance without scaling have become critical. One approachfor doing this is to increase carrier (electron and/or hole) mobilities.Increased carrier mobility can be obtained, for example, by introducingthe appropriate strain into the Si lattice.

The application of strain changes the lattice dimensions of the silicon(Si)-containing substrate. By changing the lattice dimensions, theelectronic band structure of the material is changed as well. The changemay only be slight in intrinsic semiconductors resulting in only a smallchange in resistance, but when the semiconducting material is doped,i.e., n-type, and partially ionized, a very small change in the energybands can cause a large percentage change in the energy differencebetween the impurity levels and the band edge. This results in changesin carrier transport properties, which can be dramatic in certain cases.The application of physical stress (tensile or compressive) can befurther used to enhance the performance of devices fabricated on theSi-containing substrates.

Compressive strain along the device channel increases drive current inp-type field effect transistors (pFETs) and decreases drive current inn-type field effect transistors (nFETs). Tensile strain along the devicechannel increases drive current in nFETs and decreases drive current inpFETs.

Strained silicon on relaxed SiGe buffer layer or relaxedSiGe-on-insulator (SGOI) has demonstrated higher drive current for bothnFET [K. Rim, p. 98, VLSI 2002, B. Lee, IEDM 2002] and pFET [K. Rim, etal, p. 98, VLSI 2002] devices. Even though having strained silicon onSGOI substrates or strained silicon directly on insulator (SSDOI) canreduce the short-channel effects and some process related problems suchas enhanced As diffusion in SiGe [S. Takagi, et al, p. 03-57, IEDM 2003;K. Rim et al, p. 3-49, IEDM 2003], the enhancement in the drive currentstarts to diminish as devices are scaled down to very short channeldimensions [Q. Xiang, et al, VLSI 2003; J. R. Hwang, et al, VLSI 2003].The term “very short channel” denotes a device channel having a lengthof less than about 50 nm.

It is believed that the reduction in drive currents in very shortchannel devices results from source/drain series resistance and thatmobility degradation is due to higher channel doping by strong halodoping, velocity saturation, and self-heating.

In addition, in the case of biaxial tensile strain, such as strainedepitaxially grown Si on relaxed SiGe, significant hole mobilityenhancement for pFET devices only occurs when the device channel isunder a high (>1%) strain, which is disadvantageously prone to havecrystalline defects. Further, the strain created by the lattice mismatchbetween the epitaxially grown Si atop the relaxed SiGe is reduced bystress induced by shallow trench isolation regions, wherein the effectof the shallow trench isolation regions is especially significant in thecase of devices having a dimension from the gate edge to the end of thesource/drain region on the order of about 500 nm or less. [T. Sanuki, etal, IEDM 2003].

Further scaling of semiconducting devices requires that the strainlevels produced within the substrate be controlled and that new methodsbe developed to increase the strain that can be produced. In order tomaintain enhancement in strained silicon with continued scaling, theamount of strain must be maintained or increased within thesilicon-containing layer. Further innovation is needed to increasecarrier mobility in pFET devices.

SUMMARY

The present invention provides a strained nFET device, in which improvedcarrier mobility is provided in a device channel subjected to a tensileuniaxial strain in a direction parallel to the device channel. Thepresent invention also provides a strained pFET device, in whichimproved carrier mobility is provided by a compressive uniaxial strainimported to the device in a direction parallel to the device channel.The present invention further comprises a CMOS structure including pFETand nFET devices on the same substrate, in which the device channels ofthe pFET devices are under a uniaxial compressive strain and the devicechannels of the nFET devices are under a uniaxial tensile strain, bothin a direction parallel to the device channels.

The foregoing is achieved in the present invention by forming atransistor on a semiconducting surface having a biaxial tensile strain,in which the semiconducting surface is epitaxially grown overlying aSiGe layer, or a biaxial compressive strain, in which the semiconductingsurface is epitaxially grown overlying a silicon doped with carbonlayer, and then inducing a uniaxial tensile or compressive strain on thedevice channel. The uniaxial tensile or compressive strain is producedby a strain inducing dielectric liner positioned atop the transistorand/or a strain inducing well abutting the device channel. Broadly, theinventive semiconducting structure comprises:

a substrate comprising a strained semiconducting layer overlying astrain inducing layer, wherein said strain inducing layer produces abiaxial strain in said strained semiconducting layer;

at least one gate region including a gate conductor atop a devicechannel portion of said strained semiconducting layer, said devicechannel portion separating source and drain regions adjacent said atleast one gate conductor; and

a strain inducing liner positioned on said at least one gate region,wherein said strain inducing liner produces a uniaxial strain to saiddevice channel portion of said strained semiconducting layer underlyingsaid at least one gate region.

The strain inducing layer may comprise SiGe, in which the biaxial strainin the strained semiconducting surface is in tension, or the straininducing layer may comprise silicon doped with carbon, in which thebiaxial strain of the strained semiconducting surface is in compression.

A tensile strain inducing liner positioned atop a transistor having adevice channel in biaxial tensile strain produces a uniaxial tensilestrain in the device channel, in which the uniaxial strain is in adirection parallel with the device channel and provides carrier mobilityenhancements in nFET devices. A compressive strain inducing linerpositioned atop a transistor having a device channel in a biaxialtensile strain produces a uniaxial compressive strain in the devicechannel, in which the uniaxial strain is in a direction parallel to thedevice channel and provides carrier mobility enhancements in pFETdevices. A compressive strain inducing liner positioned atop atransistor having a device channel in biaxial compressive strainproduces a uniaxial strain in the device channel, in which the uniaxialcompressive strain is in a direction parallel to the device channel andprovides carrier mobility enhancements in pFET devices.

Another aspect of the present invention is a semiconducting structure inwhich strain inducing wells adjacent the biaxially strained devicechannel induce a uniaxial compressive strain or a uniaxial tensilestrain parallel to the device channel. Broadly, the inventivesemiconducting structure comprises:

a substrate comprising a strained semiconducting layer overlying astrain inducing layer, wherein said strain inducing layer produces abiaxial strain in said strained semiconducting layer;

at least one gate region including a gate conductor atop a devicechannel portion of said strained semiconducting layer of said substrate,said device channel separating source and drain regions; and

strain inducing wells adjacent said at least one gate region, whereinsaid strain inducing wells adjacent said at least one gate regionproduce a uniaxial strain to said device channel portion of saidstrained semiconducting layer.

Strain inducing wells comprising silicon doped with carbon positionedwithin a biaxial tensile strained semiconducting layer and adjacent adevice channel produce a tensile uniaxial strain within the devicechannel, wherein the uniaxial strain is in a direction parallel to thedevice channel. The tensile uniaxial strain can provide carrier mobilityenhancements in nFET devices.

Strain inducing wells comprising SiGe positioned within a biaxialcompressively strained semiconducting layer and adjacent a devicechannel produce a compressive uniaxial strain within the device channel,wherein the uniaxial strain is in direction parallel to said devicechannel. The compressive uniaxial strain can provide carrier mobilityenhancements in pFET devices.

Another aspect of the present invention is a complementary metal oxidesemiconducting (CMOS) structure including nFET and pFET devices.Broadly, the inventive structure comprises:

a substrate comprising a compressively strained semiconducting surfaceand a tensile strained semiconducting surface, wherein saidcompressively strained semiconducting surface and said tensile strainedsemiconducting surface are strained biaxially;

at least one gate region atop said compressively strained semiconductinglayer including a gate conductor atop a device channel portion of saidcompressively strained semiconducting layer of said substrate;

at least one gate region atop said tensile strained semiconducting layerincluding a gate conductor atop a device channel portion of said tensilestrained semiconducting layer of said substrate;

a compressive strain inducing liner atop said at least one gate regionatop said compressively strained semiconducting surface, wherein saidcompressive strain inducing liner produces a compressive uniaxial strainin said device channel portion of said compressively strainedsemiconducting layer, wherein said compressive uniaxial strain is in adirection parallel to said device channel portion of said compressivelystrained semiconducting surface; and

a tensile strain inducing liner atop said at least one gate region atopsaid tensile strained semiconducting layer, wherein said tensile straininducing liner produces a uniaxial strain in said device channel portionof said tensile strained semiconducting layer, wherein said tensileuniaxial strain is in a direction parallel to said device channelportion of said tensile strained semiconducting layer

Another aspect of the present invention is a complementary metal oxidesemiconducting (CMOS) structure including NFET and pFET devices.Broadly, the inventive structure comprises:

a substrate comprising a tensile strained semiconducting layer having apFET device region and an nFET device region;

at least one gate region within said pFET device region including a gateconductor atop a pFET device channel portion of said tensile strainedsemiconducting layer;

at least one gate region within said nFET device region including a gateconductor atop an nFET device channel portion of said tensile strainedsemiconducting surface of said substrate;

a compressive strain inducing liner atop said at least one gate regionin said pFET device region, wherein said compressive strain inducingliner produces a compressive uniaxial strain in said pFET devicechannel; and

a tensile strain inducing liner atop said at least one gate region insaid nFET device region, wherein said tensile strain inducing linerproduces a uniaxial tensile strain in said nFET device channel.

The above described structure may further include strain inducing wellsadjacent at least one gate region in the nFET device region and the pFETdevice region, wherein the strain inducing wells in the pFET deviceregion increases compressive uniaxial strain and the strain inducingwells in the nFET device region increases tensile uniaxial strain.

Another aspect of the present invention is a method of forming theabove-described semiconducting structure, which includes a stressinducing liner and/or strain inducing wells that provide a uniaxialstrain within the device channel portion of the substrate. Broadly, themethod of present invention comprises the steps of:

providing a substrate having at least one strained semiconductingsurface, said at least one strained semiconducting surface having aninternal strain in a first direction and a second direction having equalmagnitude, wherein said first direction is within a same crystal planeand is perpendicular to said second direction;

producing at least one semiconducting device atop said at least onestrained semiconducting surface, said at least one semiconducting devicecomprising a gate conductor atop a device channel portion of saidsemiconducting surface, said device channel separating source and drainregions; and

forming a strain inducing liner atop said at least one gate region,wherein said strain inducing liner produces a uniaxial strain in saiddevice channel, wherein said magnitude of strain in said first directionis different than said second direction within said device channelportion of said at least one strained semiconducting surface.

Another aspect of the present invention is a method of increasing thebiaxial strain within the semiconducting layer. The biaxial strainwithin the semiconducting layer may be increased in compression ortension by forming an isolation region surrounding the active deviceregion having an intrinsically compressive or tensile dielectric fillmaterial. In accordance with the inventive method, the uniaxial strainmay be induced by forming a set of strain inducing wells adjacent the atleast one gate region instead of or in combination with, the straininducing liner.

The present invention also provides improved carrier mobility insemiconducting devices formed on a relaxed substrate, wherein a uniaxialstrain parallel to the device channel of a transistor is provided by thecombination of a strain inducing liner positioned atop the transistorand a strain inducing well positioned adjacent to the device channel.Broadly the inventive semiconductor structure comprises:

a relaxed substrate;

at least one gate region including a gate conductor atop a devicechannel portion of said relaxed substrate, said device channel portionseparating source and drain regions adjacent said at least oneconductor;

strain inducing wells adjacent said at least one gate region; and

a strain inducing liner positioned on said at least one gate regions,wherein said strain inducing liner and said strain inducing wellsproduce a uniaxial strain to said device channel portion of said relaxedportion of said substrate underlying said at least one gate region.

Another aspect of the present invention is a complementary metal oxidesemiconducting (CMOS) structure including nFET and pFET devices, whereinthe devices may be formed on a substrate having biaxially strainedsemiconducting surfaces and/or relaxed semiconducting surfaces. Broadly,one method for providing a CMOS structure formed on a substrate havingboth relaxed and biaxially strained semiconducting surfaces comprisesproviding a substrate having a first device region and a second deviceregion, producing at least one semiconducting device atop a devicechannel portion of said substrate in said first device region and saidsecond device region; and producing a uniaxial strain in said firstdevice region and said second device region, wherein said uniaxialstrain is in a direction parallel to said device channel of said firstdevice region and said second device region. The first device region maycomprise a biaxially strained semiconducting surface and the seconddevice region may comprise a relaxed semiconducting surface.

In accordance with the present invention, producing a uniaxial strain inthe first device region and the second device region further comprisesprocessing the first device region and the second device region toprovide a combination of strain inducing structures. The first deviceregion may comprise a biaxially strained semiconducting surface and astrain inducing liner atop at least one semiconductor device, abiaxially strained semiconducting surface and strain inducing wellsadjacent at least one semiconducting device, or a combination thereof.The second device region may comprise a relaxed substrate, a straininducing liner atop at least one semiconducting device and straininducing wells adjacent to at least one semiconducting device.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a pictorial representation (through a cross-sectional view) ofone embodiment of the inventive semiconducting device including a nFETdevice channel having a uniaxial tensile strain, in which the uniaxialtensile strain is in a direction parallel with the device channel.

FIG. 2. is a pictorial representation (through a cross-sectional view)of another embodiment of the inventive semiconducting device including apFET device channel having a uniaxial compressive strain atop a SiGelayer, in which the uniaxial compressive strain is in a directionparallel to the device channel.

FIG. 3 is a pictorial representation (through a cross-sectional view) ofanother embodiment of the inventive semiconducting device including apFET device channel having a uniaxial compressive strain atop a Si:Clayer, in which the uniaxial compressive strain is in a directionparallel to the device channel.

FIG. 4 is a pictorial representation (through a cross-sectional view) ofone embodiment of the inventive CMOS structure including the nFET devicedepicted in FIG. 1 and the pFET device depicted in FIG. 2.

FIG. 5 is a pictorial representation (through a cross-sectional view) ofone embodiment of the inventive CMOS structure including the NFET devicedepicted in FIG. 1 and the pFET device depicted in FIG. 3.

FIG. 6 is a pictorial representation (through a cross-sectional view) ofanother embodiment of the inventive semiconducting device including anFET device channel having a uniaxial compressive strain formed atop arelaxed semiconducting substrate.

FIG. 7 is a pictorial representation (through a cross-sectional view) ofanother embodiment of the inventive semiconducting device including apFET device channel having a uniaxial tensile strain formed atop arelaxed semiconducting substrate.

FIG. 8 is a pictorial representation (through a cross-sectional view) ofone embodiment of the inventive CMOS structure including a relaxedsubstrate region and a biaxially strained semiconductor region.

FIGS. 9( a)-9(c) are pictorial representations of the relationshipbetween lattice dimension and uniaxial strain parallel to the devicechannel in compression and tension.

FIG. 10 is a plot of I_(off) v. I_(on) for NFET devices having tensilestrain inducing and compressive strain inducing dielectric layers(tensile strain inducing and compressive strain inducing liners).

FIG. 11 is a plot of I_(off) v. I_(on) for pFET devices having tensilestrain inducing and compressive strain inducing dielectric layers(tensile strain inducing and compressive strain inducing liners),

DETAILED DESCRIPTION OF THE INVENTION

The present invention provides a CMOS structure including pFET and nFETdevices, in which the symmetry of the unit lattice in the device channelof each device type can be broken down into three directions, where thelattice dimension (constant) of each direction is different by at least0.05%. The lattice directions in the device channel include: parallel tothe channel plane (x-direction), perpendicular to the channel plane(y-direction) and out of the channel plane (z-direction).

The present invention further provides a strained silicon nFET in whichthe lattice constant parallel to the nFET device channel is larger thanthe lattice constant perpendicular to the nFET device channel, whereinthe lattice constant differential is induced by a tensile uniaxialstrain parallel to the device channel. The present invention alsoprovides a strained silicon pFET in which the lattice constantperpendicular to the pFET device channel is larger than the latticeconstant parallel to the pFET device channel wherein the latticeconstant differential is induced by a compressive uniaxial strainparallel to the device channel. The present invention further provides apFET and/or NFET device on a relaxed substrate surface wherein thecombination of a strain inducing liner and a strain inducing wellproduce a uniaxial strain parallel to the device channel portion of thepFET and/or nFET device.

The present invention is now discussed in more detail referring to thedrawings that accompany the present application. In the accompanyingdrawings, like and/or corresponding elements are referred to by likereference numbers. In the drawings, a single gate region is shown anddescribed. Despite this illustration, the present invention is notlimited to a structure including a single gate region. Instead, aplurality of such gate regions is contemplated.

Referring to FIG. 1, in one embodiment of the present invention, ann-type field effect transistor (nFET) 20 is provided having a uniaxialtensile strain in the device channel 12 of the layered stack 10, inwhich the uniaxial tensile strain is in a direction parallel to thelength of the device channel 12. The length of the device channel 12separates the extensions 7 of the source and drain regions 13, 14 of thedevice. The uniaxial tensile strain within the device channel 12 of thenFET 20 is produced by the combination of the biaxial tensile strainedsemiconducting layer 15 and a tensile strain inducing liner 25. The gateregion 5 comprises a gate conductor 3 atop a gate dielectric 2.

The biaxial tensile strained semiconducting layer 15 is formed byepitaxially growing silicon atop a SiGe strain inducing layer 17. Abiaxial tensile strain is induced in epitaxial silicon grown on asurface formed of a material whose lattice constant is greater than thatof silicon. The lattice constant of germanium is about 4.2 percentgreater than that of silicon, and the lattice constant of a SiGe alloyis linear with respect to its' germanium concentration. As a result, thelattice constant of a SiGe alloy containing fifty atomic percentgermanium is about 2.1 times greater than the lattice constant ofsilicon. Epitaxial growth of Si on such a SiGe strain inducing layer 17yields a Si layer under a biaxial tensile strain, with the underlyingSiGe strain inducing layer 17 being essentially unstrained, or relaxed,fully or partially.

The term “biaxial tensile” denotes that a tensile strain is produced ina first direction parallel to the nFET device channel 12 and in a seconddirection perpendicular to the nFET device channel 12, in which themagnitude of the strain in the first direction is equal to the magnitudeof the strain in the second direction.

The tensile strain inducing liner 25, preferably comprises Si₃N₄, and ispositioned atop the gate region 5 and the exposed surface of the biaxialtensile strained semiconducting layer 15 adjacent to the gate region 5.The tensile strain inducing liner 25, in conjunction with the biaxialtensile strained semiconducting layer 15, produces a uniaxial tensilestrain on the device channel 12 ranging from about 100 MPa to about 3000MPa, in which the direction of the uniaxial strain on the device channel12 is parallel to the length of the device channel 12.

Before the tensile strain inducing liner 25 is formed, the devicechannel 12 is in a biaxial tensile strain, wherein the magnitude of thestrain produced in the direction perpendicular to the device channel 12is equal the strain produced in the direction parallel to the devicechannel 12. The application of the tensile strain inducing liner 25produces a uniaxial strain in the direction parallel to the devicechannel x-direction) 12, wherein the magnitude of the tensile strainparallel to the device channel 12 is greater than the magnitude of thetensile strain perpendicular to the device channel 12. Further, thelattice constant within the nFET device 20 along the device channel 12is greater than the lattice constant across the device channel 12.

Still referring to FIG. 1, in another embodiment of the presentinvention, tensile strain inducing wells 30 are positioned adjacent tothe device channel 12 in respective source and drain regions 13, 14. Thetensile strain inducing well 30 comprises silicon doped with carbon(Si:C) or silicon germanium doped with carbon (SiGe:C). The tensilestrain inducing wells 30 comprising intrinsically tensile Si:C can beepitaxially grown atop a recessed portion of the biaxial tensilestrained semiconducting layer 15. The term “intrinsically tensile Si:Clayer” denotes that a Si:C layer is under an internal tensile strain, inwhich the tensile strain is produced by a lattice mismatch between thesmaller lattice dimension of the Si:C and the larger lattice dimensionof the layer on which the Si:C is epitaxially grown. The tensile straininducing wells 30 produce a uniaxial tensile strain within the devicechannel 12 in a direction parallel to the nFET device channel 12.

In one embodiment, the tensile strain inducing wells 30 may be omittedwhen the tensile strain inducing liner 25 is provided. In anotherembodiment of the present invention, the tensile strain inducing liner25 may be omitted when the tensile strain inducing wells 30 areprovided. In yet another embodiment, both the tensile strain inducingwells 30 and the tensile strain inducing liner 25 are employed. Themethod for forming the inventive nFET 20 is now described in greaterdetail.

In a first process step, a layered stack 10 is provided comprising abiaxial tensile strained semiconducting layer IS. The layered stack 10may include: tensile strained Si on SiGe, strained Si onSiGe-on-insulator (SSGOI) or tensile strained Si directly on insulator(SSDOI). In a preferred embodiment, layered stack 10 comprises tensileSSGOI having a silicon-containing biaxial tensile strainedsemiconducting layer 15 atop a SiGe strain inducing layer 17.

In a first process step, a SiGe strain inducing layer 17 is formed atopa Si-containing substrate 9. The term “Si-containing layer” is usedherein to denote a material that includes silicon. Illustrative examplesof Si-containing materials include, but are not limited to: Si, SiGe,SiGeC, SiC, polysilicon, i.e., polySi, epitaxial silicon, i.e., epi-Si,amorphous Si, i.e., a:Si, SOI and multilayers thereof. An optionalinsulating layer may be positioned between the SiGe strain inducinglayer 17 and the Si-containing substrate 9.

The SiGe strain inducing layer 17 is formed atop the entireSi-containing substrate 10 using an epitaxial growth process or by adeposition process, such as chemical vapor deposition (CVD). The Gecontent of the SiGe strain inducing layer 17 typically ranges from 5% to50%, by atomic weight %, with from 10% to 20% being even more typical.Typically, the SiGe strain inducing layer 17 can be grown to a thicknessranging from about 10 nm to about 100 nm.

The biaxial tensile strained semiconducting layer 15 is then formed atopthe SiGe layer 17. The biaxial tensile strained semiconducting layer 15comprises an epitaxially grown Si-containing material having latticedimensions that are less than the lattice dimensions of the underlyingSiGe layer 17. The biaxial tensile strained semiconducting layer 15 canbe grown to a thickness that is less than its critical thickness.Typically, the biaxially tensile strained semiconducting layer 15 can begrown to a thickness ranging from about 10 nm to about 100 nm.

Alternatively, a biaxial tensile strained semiconducting layer 15 can beformed directly atop an insulating layer to provide a strained silicondirectly on insulator (SSDOI) substrate. In this embodiment, a biaxialtensile strained semiconducting layer 15 comprising epitaxial Si isgrown atop a wafer having a SiGe surface. The biaxial tensile strainedsemiconducting layer 15 is then bonded to a dielectric layer of asupport substrate using bonding methods, such as thermal bonding.Following bonding, the wafer having a SiGe surface and the SiGe layeratop the strained Si layer are removed using a process including smartcut and etching to provide a biaxial tensile strained semiconductinglayer 26 directly bonded to a dielectric layer. A more detaileddescription of the formation of a strained Si directly on insulatorsubstrate 105 having at least a biaxial tensile strained semiconductinglayer 15 is provided in co-assigned U.S. Pat. No. 6,603,156 entitledSTRAINED Si ON INSULATOR STRUCTURES, the entire content of which isincorporated herein by reference.

Following the formation of the stacked structure 10 having a biaxialtensile strained semiconducting layer 15, nFET devices 20 are thenformed using conventional MOSFET processing steps including, but notlimited to: conventional gate oxidation pre-clean and gate dielectric 2formation; gate electrode 3 formation and patterning; gate reoxidation;source and drain extension 7 formation; sidewall spacer 4 formation bydeposition and etching; and source and drain 13, 14 formation.

In a next process step, a tensile strain inducing liner 25 is thendeposited at least atop the gate region 5 and the exposed surface of thebiaxial tensile strained semiconducting layer 15 adjacent to the gateregion 5. The tensile strain inducing liner 25 in conjunction with thebiaxial tensile strained semiconducting layer 15 produces a uniaxialtensile strain within the device channel 12 of the nFET device having adirection parallel with the device channel 12. The tensile straininducing liner 25 may comprise a nitride, an oxide, a doped oxide suchas boron phosphate silicate glass, Al₂O₃, HfO₂, ZrO₂, HfSiO, otherdielectric materials that are common to semiconductor processing or anycombination thereof. The tensile strain inducing liner 25 may have athickness ranging from about 10 nm to about 500 nm, preferably beingabout 50 nm. The tensile strain inducing liner 25 may be deposited byplasma enhanced chemical vapor deposition (PECVD) or rapid thermalchemical vapor deposition (RTCVD).

Preferably, the tensile strain inducing liner 25 comprises a nitride,such as Si₃N₄, wherein the process conditions of the deposition processare selected to provide an intrinsic tensile strain within the depositedlayer. For example, plasma enhanced chemical vapor deposition (PECVD)can provide nitride stress inducing liners having an intrinsic tensilestrain. The stress state of the nitride stress including linersdeposited by PECVD can be controlled by changing the depositionconditions to alter the reaction rate within the deposition chamber.More specifically, the stress state of the deposited nitride straininducing liner may be set by changing the deposition conditions such as:SiH₄/N₂/He gas flow rate, pressure, RF power, and electrode gap.

In another example, rapid thermal chemical vapor deposition (RTCVD) canprovide nitride tensile strain inducing liners 25 having an internaltensile strain. The magnitude of the internal tensile strain producedwithin the nitride tensile strain inducing liner 25 deposited by RTCVDcan be controlled by changing the deposition conditions. Morespecifically, the magnitude of the tensile strain within the nitridetensile strain inducing liner 25 may be set by changing depositionconditions such as: precursor composition, precursor flow rate andtemperature.

In another embodiment of the present invention, tensile strain inducingwells 30 may be formed following the formation of the nFET devices 20and prior to the deposition of the tensile strain inducing liner 25. Ina first process step, a recess is formed within the portion of thebiaxially tensile strained semiconducting layer 15, in which the sourceand drain regions 13, 14 are positioned. The recess may be formed usingphotolithography and etching. Specifically an etch mask, preferablycomprising a patterned photoresist, is formed atop the surface of theentire structure except the portion of the biaxially tensile strainedsemiconducting layer 15 adjacent the gate region. A directional(anisotropic) etch then recesses the surface of the biaxially tensilestrained semiconducting layer 15 overlying the source and drain regions13, 14 to a depth of about 10 nm to about 300 nm from the surface onwhich the gate region 5 is positioned.

In a preferred embodiment, the tensile strain inducing wells 30 encroachunderneath the sidewall spacers 4 that abut the gate electrode 3 in thegate region 5. By positioning the tensile strain inducing wells 30closer to the device channel 12, the strain produced along the devicechannel 12 is increased. The tensile strain inducing wells 30 may bepositioned in closer proximity to the device channel 12 by an etchprocess including a first directional (anisotropic) etch followed by annon-directional (isotropic) etch, in which the non-directional etchundercuts the sidewall spacers 4 to provide a recess encroaching thedevice channel 12.

In a next process step, silicon doped with carbon (Si:C) is thenepitaxially grown atop the recessed surface of the biaxial tensilestrained semiconducting layer 15 overlying the source and drain regions13, 14 forming the tensile strain inducing wells 30. The epitaxiallygrown Si:C is under an internal tensile strain (also referred to as anintrinsic tensile strain), in which the tensile strain is produced by alattice mismatch between the smaller lattice dimension of theepitaxially grown Si:C and the larger lattice dimension of the recessedsurface of the biaxial tensile strained semiconducting layer 15 on whichthe Si:C is epitaxially grown. The tensile strain inducing wells 30produce a uniaxial tensile strain within the device channel 12 of thenFET device 20 having a direction parallel with the device channel 12.Although Si:C is preferred, any intrinsically tensile material may beutilized, such as Si, intrinsically tensile nitrides and oxides, so longas a uniaxial tensile strain is produced within the device channel 12.

In another embodiment of the present invention, a tensile straininducing isolation region 50 is then formed comprising an intrinsicallytensile dielectric fill, wherein the intrinsically tensile dielectricfill increases the magnitude of the strain within the biaxially tensilestrained semiconducting layer 15 by about 0.05 to about 1%. Theisolation regions 50 are formed by first etching a trench using adirectional etch process, such as reactive ion etch. Following trenchformation, the trenches are then filled with a dielectric having anintrinsic tensile strain, such as nitrides or oxides deposited bychemical vapor deposition. The deposition conditions for producing theintrinsically tensile dielectric fills are similar to the depositionconditions disclosed above for forming the tensile strained dielectricliner 25. A conventional planarization process such aschemical-mechanical polishing (CMP) may optionally be used to provide aplanar structure.

Referring to FIG. 2 and in another embodiment of the present invention,a p-type field effect transistor (pFET) 45 is provided having a uniaxialcompressive strain in the device channel 12 of the substrate 10, inwhich the uniaxial compressive strain is in a direction parallel to thelength of the device channel 12. In this embodiment, the uniaxialcompressive strain is produced by the combination of the biaxial tensilestrained semiconducting layer 15 and a compressive strain inducing liner55.

The biaxial tensile strained semiconducting layer 15 is epitaxiallygrown Si atop a SiGe strain inducing layer 17 similar to the biaxialtensile strained semiconducting layer 15 described above with referenceto FIG. 1. The biaxial tensile strained semiconducting layer 15, cancomprise epitaxial silicon grown atop a SiGe strain inducing layer 17,in which the Ge concentration of the SiGe strained inducing layer 17 isgreater than 5%.

Referring back to FIG. 2, the compressive strain inducing liner 55,preferably comprises Si₃N₄, and is positioned atop the gate region 5 andthe exposed surface of the biaxial tensile strained semiconducting layer15 adjacent to the gate region 5. The compressive strain inducing liner55 in conjunction with the biaxial tensile strained semiconducting layer15 produces a uniaxial compressive strain on the device channel 12ranging from about 100 MPa to about 2000 MPa, in which the direction ofthe uniaxial strain is parallel to the length of the device channel 12.

Before the compressive strain inducing liner 55 is formed, the devicechannel 12 is in a biaxial tensile strain, wherein the magnitude of thetensile strain produced in the direction perpendicular to the devicechannel 12 is equal the tensile strain produced in the directionparallel to the device channel 12. The application of the compressivestrain inducing liner 55 produces a uniaxial compressive strain in adirection parallel to the device channel 12. Therefore, the latticeconstant within the pFET device 45 across the device channel 12 isgreater than the lattice constant along the device channel 12.

Still referring to FIG. 2, and in another embodiment of the presentinvention, compressive strain inducing wells 60 are positioned adjacentthe device channel 12 in respective source and drain regions 13, 14. Thecompressive strain inducing wells 60 comprising intrinsicallycompressive SiGe can be epitaxially grown atop a recessed portion of thebiaxial tensile strained semiconducting layer 15. The term“intrinsically compressive SiGe layer” denotes that a SiGe layer isunder an intrinsic compressive strain (also referred to as an intrinsiccompressive strain), in which the compressive strain is produced by alattice mismatch between the larger lattice dimension of the SiGe andthe smaller lattice dimension of the layer on which the SiGe isepitaxially grown. The compressive strain inducing wells 60 produce auniaxial compressive strain within the device channel 12. The uniaxialcompressive strain within the device channel 12 can be increased bypositioning the compressive strain inducing wells 60 in close proximityto the device channel. In one preferred embodiment, the compressivestrain inducing wells 60 encroach underneath the sidewall spacers 4 thatabut the gate electrode 3 in the gate region 5.

The method for forming the inventive pFET 45 is now described. In afirst process step, a layered structure 10 is provided having a biaxialtensile strained semiconducting layer 15. In one embodiment, the layeredstructure 10 comprises a biaxial tensile strained semiconducting layer15 overlying a SiGe strain inducing layer 17, in which the SiGe straininducing layer 17 is formed atop a Si-containing substrate 9. TheSi-containing substrate 9 and the SiGe layer 17 are similar to theSi-containing substrate 9 and the SiGe layer 17 described above withreference to FIG. 1.

Following the formation of the layered structure 10, pFET devices 45 arethen formed using conventional processes. The pFET devices 45 are formedusing MOSFET processing similar to those for producing the nFET devices20, as described with reference to FIG. 1, with the exception that thesource and drain regions 13, 14 are p-type doped.

Referring back to FIG. 2, in a next process step, a compressive straininducing liner 55 is then deposited at least atop the gate region 5 andthe exposed surface of the biaxial tensile strained semiconducting layer15 adjacent to the gate region 5. The compressive strain inducing liner55 may comprise a nitride, an oxide, a doped oxide such as boronphosphate silicate glass, Al₂O₃, HfO₂, ZrO₂, HfSiO, other dielectricmaterials that are common to semiconductor processing or any combinationthereof. The compressive strain inducing liner 55 may have a thicknessranging from about 10 nm to about 100 nm, preferably being about 50 nm.The compressive strain inducing liner 55 may be deposited by plasmaenhanced chemical vapor deposition (PECVD).

Preferably, the compressive strain inducing liner 55 comprises anitride, such as Si₃N₄, wherein the process conditions of the depositionprocess are selected to provide an intrinsic compressive strain withinthe deposited layer. For example, plasma enhanced chemical vapordeposition (PECVD) can provide nitride strain inducing liners having acompressive internal strain. The stress state of the deposited nitridestrain inducing liner may be set by changing the deposition conditionsto alter the reaction rate within the deposition chamber, in which thedeposition conditions include SiH₄N₂/He gas flow rate, pressure, RFpower, and electrode gap.

In another embodiment of the present invention, SiGe compressive straininducing wells 60 may be formed following the formation of the pFETdevices 45 and prior to the deposition of the compressive straininducing liner 55. In a first process step, a recess is formed withinthe portion of the biaxial tensile strained semiconducting layer 15adjacent to the gate region 5, in which the source and drain regions 13,14 are positioned. The recess may be formed using photolithography andetching. Specifically an etch mask, preferably comprising patternedphotoresist, is formed atop the surface of the entire structure exceptthe portion of the biaxial tensile strained semiconducting layer 15adjacent the gate region. A directional etch process then recesses thesurface of the biaxial tensile strained semiconducting layer 15overlying the source and drain regions 13, 14 to a depth of about 10 nmto about 300 nm from the surface on which the gate region 5 ispositioned. In a preferred embodiment, the compressive strain inducingwells 60 may be positioned in closer proximity to the device channel byan etch process including a first directional (anisotropic) etchfollowed by a non-directional (isotropic) etch, in which thenon-directional etch undercuts the sidewall spacers 4 to provide arecess encroaching the device channel 12. By positioning the compressivestrain inducing wells 60 closer to the device channel 12, the strainproduced along the device channel 12 is increased

In a next process step, SiGe is then epitaxially grown atop the recessedsurface of the biaxial tensile strained semiconducting layer 15overlying the source and drain regions 13, 14 forming the compressivestrain inducing wells 60. The epitaxially grown SiGe is under aninternal compressive strain (also referred to as an intrinsiccompressive strain), in which the compressive strain is produced by alattice mismatch between the larger lattice dimension of the epitaxiallygrown SiGe and the smaller lattice dimension of the recessed surface ofthe biaxial tensile strained semiconducting layer 15, on which the SiGeis epitaxially grown. The compressive strain inducing wells 60 produce auniaxial compressive strain within the device channel 12 of the pFETdevice 45 having a direction parallel to the device channel 12.

In one embodiment, the compressive strain inducing wells 60 may beomitted when the compressive strain inducing liner 55 is provided. Inanother embodiment of the present invention, the compressive straininducing liner 55 may be omitted when the compressive strain inducingwells 60 are provided.

In another embodiment of the present invention, a compressive straininducing isolation region 65 is formed comprising an intrinsicallycompressive dielectric fill, wherein the intrinsically compressivedielectric fill increases the magnitude of the strain in the biaxialtensile strained semiconducting layer 15 by about 0.05 to about 1%. Thecompressive strain inducing isolation regions 65 are formed by firstetching a trench using a directional etch process, such as reactive ionetch. Following trench formation, the trench is then filled with adielectric having an intrinsic compressive strain, such as nitrides oroxides deposited by chemical vapor deposition. The deposition conditionsfor producing the compressive strain inducing dielectric fill aresimilar to the deposition conditions disclosed above for forming thecompressive strained dielectric liner 55.

Referring to FIG. 3, in another embodiment of the present invention, apFET 75 is provided having a uniaxial compressive strain in the devicechannel 12 of the substrate 10 (a), in which the compressive uniaxialstrain is in a direction parallel to the length of the device channel12. In this embodiment, the uniaxial compressive strain is produced bythe combination of the biaxial compressive strained semiconducting layer26 and a compressive strain inducing liner 55.

The biaxial compressive strained semiconducting layer 26 is epitaxialsilicon grown atop a silicon doped with carbon (Si:C) strain inducinglayer 18. A biaxial compressive strain is induced in epitaxial silicongrown on a surface formed of a material whose lattice constant issmaller than that of silicon. The lattice constant of carbon is smallerthan that of silicon. Epitaxial growth of Si on such a Si:C straininducing layer 18 yields a Si layer under a biaxial compressive strain,with the underlying Si:C strain inducing layer 18 being essentiallyunstrained, or relaxed. The term “biaxially compressive” denotes that acompressive strain is produced in a first direction parallel to thedevice channel 12 and in a second direction perpendicular to the devicechannel 12, where the magnitude of the strain in the first direction isequal to the magnitude of the strain in the second direction.

The compressive strain inducing liner 55 is similar to the compressivestrain inducing liner described above with reference to FIG. 2 andpreferably comprises Si₃N₄. Referring back to FIG. 3, the compressivestrain inducing liner 55 is positioned atop the gate region 5 and theexposed surface of the biaxial compressive strained semiconducting layer26 adjacent to the gate region 5.

The compressive strain inducing liner 55 produces a uniaxial compressivestrain on the device channel 12 ranging from about 100 MPa to about 2000MPa, in which the direction of the uniaxial strain is parallel to thelength of the device channel 12.

Before the compressive strain inducing liner 55 is formed, the devicechannel 12 is in a biaxial compressive strain; since the magnitude ofthe strain produced in the direction perpendicular to the device channel12 is equal the strain produced in the direction parallel to the devicechannel 12. The application of the compressive strain inducing liner 55produces a uniaxial strain in the direction parallel the device channel12, wherein the magnitude of the compressive strain perpendicular to thedevice channel 12 is less than the magnitude of the compressive strainparallel the device channel 12. Further, the lattice constant within thepFET device 75 perpendicular the device channel 12 is greater than thelattice constant along the device channel 12.

Still referring to FIG. 3, in another embodiment of the presentinvention, SiGe compressive strain inducing wells 60 are positionedadjacent the device channel 12. The compressive strain inducing wells 60comprising intrinsically compressive SiGe can be epitaxially grown atopa recessed portion of the biaxial compressive strained semiconductinglayer 26 and is similar to the SiGe compressive strain inducing well 60described with reference to FIG. 2. Preferably, SiGe compressive straininducing wells 60 encroach underneath the sidewall spacers 4 that abutthe gate electrode 3 in the gate region 5.

The method for forming the inventive pFET 75 is now described in greaterdetail. In a first process step, a stacked structure 10(a) is providedhaving a biaxial compressive strained semiconducting layer 26 overlyinga Si:C strain inducing layer 18, in which the Si:C strain inducing layer18 is formed atop a Si-containing substrate 9. The Si-containingsubstrate 9 depicted in FIG. 3 is similar to the Si-containing substrate9 described above with reference to FIG. 1.

The Si:C strain inducing layer 18 is formed atop the entireSi-containing substrate 9 using an epitaxial growth process, wherein theC content of the Si:C strain inducing layer 18 is less than about 6%, byatomic %, preferably ranging from 0.5% to 4%. Typically, the Si:C straininducing layer 18 can be grown to a thickness ranging from about 10 nmto about 100 nm.

The biaxial compressive strained semiconducting layer 26 is then formedatop the Si:C strain inducing layer 18. The biaxial compressive strainedsemiconducting layer 26 comprises an epitaxially grown Si-containingmaterial having lattice dimensions that are larger than the latticedimensions of the underlying Si:C layer 18. The biaxial compressivestrained semiconducting layer 26 can be grown to a thickness that isless than its' critical thickness. Typically, the biaxial compressivestrained semiconducting layer 26 can be grown to a thickness rangingfrom about 10 nm to about 100 nm.

Alternatively, a biaxial compressively strained semiconducting layer 26can be formed directly atop an insulating layer to provide a strainedsilicon directly on insulator (SSDOI) substrate. In this embodiment, acompressively strained semiconducting layer 26 comprising epitaxial Siis grown atop a handling wafer having a Si:C surface. The compressivelystrained semiconducting layer 26 is then bonded to a dielectric layer ofa support substrate using bonding methods, such as thermal bonding.Following bonding, the handling wafer having a Si:C surface is removedusing smart cut and etching to provide a biaxial compressive strainedsemiconducting layer 26 directly bonded to a dielectric layer.

Following the formation of the layered structure 10(a), pFET devices 75are formed atop the biaxial compressively strained semiconducting layer26, as described with reference to FIG. 2.

Referring back to FIG. 3, in a next process step, a compressive straininducing liner 55 is then deposited at least atop the gate region 5 andthe exposed surface of the biaxial compressive strained semiconductinglayer 26 adjacent to the gate region 5. The compressive strain inducingliner 55 is similar to the compressive strain inducing liner describedabove with reference to FIG. 2.

Preferably, the compressive strain inducing liner 55 comprises anitride, such as Si₃N₄, wherein the process conditions of the depositionprocess are selected to provide an intrinsic compressive strain withinthe deposited layer. For example, plasma enhanced chemical vapordeposition (PECVD) can provide nitride stress inducing liners having acompressive internal stress. The stress state of the deposited nitridestress inducing liner may be set by changing the deposition conditionsto alter the reaction rate within the deposition chamber, in which thedeposition conditions include SiH₄/N₂/He gas flow rate, pressure, RFpower, and electrode gap.

Similar to the embodiment depicted in FIG. 2, compressive straininducing wells 60, preferably comprising intrinsically compressive SiGe,and compressive strain inducing isolation regions 65, preferablycomprising intrinsically compressive dielectric fill, may then be formedas depicted in FIG. 3. Preferably, the compressive strain inducing wells60 encroach underneath the sidewall spacers 4 that abut the gateelectrode 3 in the gate region 5.

Referring to FIG. 4, in another embodiment of the present invention, aCMOS structure is provided incorporating the nFET devices 20 of thepresent invention as depicted in FIG. 1, and the pFET devices 45 of thepresent invention as depicted in FIG. 2, on the same substrate 100. EachnFET device 20 has a device channel 12 in which the lattice constant inthe direction parallel to the nFET device channel 12 is larger than thelattice constant in the direction perpendicular to the nFET devicechannel 12, wherein the lattice constant differential is induced by atensile uniaxial strain. Each pFET 45 has a device channel 12 in whichthe lattice constant in the direction perpendicular to the pFET devicechannel 12 is larger than the lattice constant parallel to the pFETdevice channel 12, wherein the lattice constant differential is inducedby a compressive uniaxial strain. The CMOS structure depicted in FIG. 4is formed using the above-described methods for producing the nFETdevice 20 and the pFET device 45.

More specifically, a layered structure 100 is first provided including abiaxial tensile strained semiconducting layer 15 formed overlying a SiGestrain inducing layer 17, as described above with reference to FIG. 1.NFET devices 20 are then formed within an nFET device region 120 of thesubstrate 100 and pFET devices 45 are then formed within a pFET deviceregion 140 of the substrate 100, wherein the nFET device region 120 isseparated from the pFET device region by an isolation region 70. Similarto the previous embodiments, the biaxial strain produced within the pFETdevice region 140 and the nFET device region 120 may be increased byfilling the isolation region 70 with an intrinsically compressive orintrinsically tensile dielectric fill.

The pFET device region 140 and the NFET device region 120 are thenselectively processed using conventional block masks. For example, afirst block mask is formed atop the pFET device region 140, leaving thenFET device region 120 exposed. The nFET device region 120 is thenprocessed to produce nFET devices 20, a tensile strain inducing liner 25and tensile strain inducing wells 30, as described above with referenceto FIG. 1. The nFET device region 120 and the pFET device region 140 areseparated by an isolation region 70, wherein an intrinsically tensile orintrinsically compressive dielectric fill material can increase thebiaxial strain within the nFET or pFET device regions 120, 140.

The first block mask is then removed and a second block mask is formedatop the nFET device region 120, leaving the pFET device region 140exposed. The pFET device region 140 is processed to produce pFET devices45, a compressive strain inducing liner 55 and compressive straininducing wells 60, as described above with reference to FIG. 2. Thesecond block mask is then removed.

Referring to FIG. 5, in another embodiment of the present invention, aCMOS structure is provided incorporating the nFET device 20, depicted inFIG. 1, and the pFET device 75, depicted in FIG. 3, on the samesubstrate. The CMOS structure depicted in FIG. 5 provides furtherenhancement of nFET current drive as well as improvement of pFET currentdrive on the same substrate 105.

The CMOS structure depicted in FIG. 5 is formed using theabove-described methods for producing nFET devices 20, as depicted inFIG. 1, and the pFET devices 75, as depicted in FIG. 3, wherein blockmasks are utilized to selectively process the portion of the CMOSstructure in which the nFET devices 20 and the pFET devices 75 areformed.

First, a strained Si substrate 105 is provided having at least a biaxialcompressively strained semiconducting layer 26 overlying a Si:C straininducing layer 18 in the pFET device region 140 and a biaxial tensilestrained compressive layer 15 overlying a SiGe strain inducing layer 17in the NFET device region 120. The strained Si substrate 105 may beformed using deposition, epitaxial growth, photolithography and etching.A more detailed description of the formation of a biaxial strained Sisubstrate 105 comprising a compressively strained semiconducting layer26 and a tensile strained semiconducting layer 15 is provided inco-assigned U.S. patent application Ser. No. 10/859,736, filed Jun. 3,2004 entitled STRAINED Si ON MULTIPLE MATERIALS FOR BULK OR SOISUBSTRATE, the entire content of which is incorporated herein byreference.

In a next process step, a first block mask is formed atop the pFETdevice region 140, leaving the biaxial tensile strained semiconductinglayer 15 in the nFET device region 120 exposed. The biaxial tensilestrained semiconducting layer 15 is processed to provide nFET devices 20comprising a tensile strain inducing liner 25 and tensile straininducing wells 30, wherein a tensile uniaxial strain is produced withinthe nFET device channels 12. The NFET devices 20 are processed inaccordance with the method described above with reference to FIG. 1.

Following the formation of the nFET devices 20, the first block mask isstripped to expose the biaxial compressive strained semiconducting layer26 and a second block mask is formed atop the nFET devices 20 positionedin the biaxial tensile strained semiconducting layer 15. The biaxialcompressively strained semiconducting layer 26 is processed to providepFET devices 75 comprising a compressive strain inducing liner 55 andcompressive strain inducing wells 60, in which a uniaxial compressivestrain is produced within the device channel 12 of the pFET devices 75.The pFET devices 75 are processed in accordance with the methoddescribed above with reference to FIG. 3.

Referring to FIG. 6, in another embodiment of the present invention, an-type field effect transistor (nFET) 20 is provided having a uniaxialtensile strain in the device channel 12 portion of a relaxed substrate85 is which the uniaxial tensile strain is in a direction parallel tothe length of the device channel 12. The uniaxial tensile strain alongthe device channel 12 of the nFET device 20 is produced by thecombination of a tensile strain inducing liner 25 and a tensile straininducing well 30.

The term “relaxed substrate” denotes a substrate that does not have aninternal strain, in which the lattice dimension in the directionparallel to the channel plane (x-direction), perpendicular to thechannel plane (y-direction) and out of the channel plane (z-direction)are the same. The relaxed substrate 85 may comprise any semiconductingmaterial, including but not limited to: Si, strained Si, Si_(1-y)C_(y),Si_(1-x-y)Ge_(x)C_(y), Si_(1-x)Ge_(x), Si alloys, Ge, Ge alloys, GaAs,InAs, InP as well as other III-V and II-VI semiconductors. The relaxedsubstrate 85 may also be silicon-on-insulator substrates (SOI) orSiGe-on-insulator (SGOI) substrates. The thickness of the relaxedsubstrate 85 is inconsequential to the present invention. Preferably,the relaxed substrate 85 comprises a Si-containing material.

The tensile strain inducing liner 25, preferably comprises Si₃N₄, and ispositioned atop the gate region 5 and the exposed surface of the relaxedsubstrate 85 adjacent to the gate region 5. The tensile strain inducingliner 25 may comprise a nitride, an oxide, a doped oxide such as boronphosphate silicate glass, Al₂O₃, HfO₂, ZrO₂, HfSiO, other dielectricmaterials that are common to semiconductor processing or any combinationthereof. The tensile strain inducing liner 25 may have a thicknessranging from about 10 nm to about 500 nm, preferably being about 50 nm.The tensile strain inducing liner 25 may be deposited by plasma enhancedchemical vapor deposition (PECVD) or rapid thermal chemical vapordeposition (RTCVD).

Preferably, the tensile inducing liner 25 comprises a nitride, such asSi₃N₄, wherein the process conditions of the deposition process areselected to provide an intrinsic tensile strain within the depositedlayer. For example, plasma enhanced chemical vapor deposition (PECVD)can provide nitride stress inducing liners having an intrinsic tensilestrain. The stress state of the nitride stress including linersdeposited by PECVD can be controlled by changing the depositionconditions to alter the reaction rate within the deposition chamber.More specifically, the stress state of the deposited nitride straininducing liner may be set by changing the deposition conditions such as:SiH₄/N₂/He gas flow rate, pressure, RF power, and electrode gap. Inanother example, rapid thermal chemical vapor deposition (RTCVD) canprovide nitride tensile strain inducing liners 25 having an internaltensile strain. The magnitude of the internal tensile strain producedwithin the nitride tensile strain inducing liner 25 deposited by RTCVDcan be controlled by changing the deposition conditions. Morespecifically, the magnitude of the tensile strain within the nitridetensile strain inducing liner 25 may be set by changing depositionconditions such as: precursor composition, precursor flow rate andtemperature.

The tensile strain inducing wells 30 are positioned adjacent the devicechannel 12 in respective source and drain regions 13, 14. The tensilestrain inducing well 30 can comprise silicon doped with carbon (Si:C) orsilicon germanium doped with carbon (SiGe:C). The tensile straininducing wells 30 comprising intrinsically tensile Si:C can beepitaxially grown atop a recessed portion of the relaxed substrate 85.

The tensile strain inducing wells 30 in combination with the tensilestrain inducing liner 25 produces a uniaxial tensile strain within thedevice channel 12 in a direction parallel with the NFET device channel12. The combination of the tensile strain inducing liner 25 and thestrain inducing wells 30 produces a uniaxial compressive strain on thedevice channel 12 ranging from about 100 MPa to about 2000 MPa, in whichthe direction of the uniaxial strain is parallel to the length of thedevice channel 12. The method for forming the structure depicted in FIG.1 is applicable for providing the structure depicted in FIG. 6 with theexception that the method of forming the structure depicted in FIG. 6includes a relaxed substrate 85 as opposed to a strained substrate ofthe previous embodiment.

Referring to FIG. 7, in another embodiment of the present invention, ap-type field effect transistor (pFET) 45 is provided having a uniaxialcompressive strain in the device channel 12 portion of a relaxedsubstrate 85 is which the uniaxial compressive strain is in a directionparallel to the length of the device channel 12. A compressive straininducing liner 55 in combination with compressive strain inducing wells60 produces a compressive uniaxial strain along the device channel 12portion of the relaxed substrate 85, wherein the uniaxial compressivestrain parallel to the device channel provides carrier mobilityenhancements in pFET devices 45.

The relaxed substrate 85 is similar to the relaxed substrate depicted inthe FIG. 6. The application of the compressive strain inducing liner 55in combination with the compressive strain inducing wells 60 produces auniaxial compressive strain in a direction parallel to the devicechannel 12. Therefore, the lattice constant within the pFET device 45across the device channel 12 is greater than the lattice constant alongthe device channel 12.

The compressive strain inducing liner 55 may comprise a nitride, anoxide, a doped oxide such as boron phosphate silicate glass, Al₂O₃,HfO₂, ZrO₂, HfSiO, other dielectric materials that are common tosemiconductor processing or any combination thereof. The compressivestrain inducing liner 55 may have a thickness ranging from about 10 nmto about 100 nm, preferably being about 50 nm. The compressive straininducing liner 55 may be deposited by plasma enhanced chemical vapordeposition (PECVD).

Preferably, the compressive strain inducing liner 55 comprises anitride, such as Si₃N₄, wherein the process conditions of the depositionprocess are selected to provide an intrinsic tensile strain within thedeposited layer. For example, plasma enhanced chemical vapor deposition(PECVD) can provide nitride stress inducing liners having a compressiveinternal stress. The stress state of the deposited nitride stressinducing liner may be set by changing the deposition conditions to alterthe reaction rate within the deposition chamber, in which the depositionconditions include SiH₄/N₂/He gas flow rate, pressure, RF power, andelectrode gap.

The compressive strain inducing wells 60 are positioned adjacent thedevice channel 12 in respective source and drain regions 13, 14. Thecompressive strain inducing well 60 can comprise SiGe. The compressivestrain inducing wells 60 comprising intrinsically compressive SiGe canbe epitaxially grown atop a recessed portion of the relaxed substrate85.

The combination of the compressive strain inducing liner 55 and thecompressive strain inducing wells 60 produces a uniaxial compressivestrain on the device channel 12 ranging from about 100 MPa to about 2000MPa, in which the direction of the uniaxial compressive strain isparallel to the length of the device channel 12. The method for formingthe structure depicted in FIG. 2 is applicable for providing thestructure depicted in FIG. 7 with the exception that the method offorming the structure depicted in FIG. 7 includes a relaxed substrate85.

Referring to FIG. 8, in another embodiment of the present invention, aCMOS structure is provided incorporating at least one field effecttransistor (FET) 151 having a uniaxial strain along the device channel12 of a relaxed substrate region 150 and at least one FET 149 having auniaxial strain along the device channel 12 of a biaxially strainedsubstrate region 160.

The uniaxial strain in the relaxed substrate region 150 is provided bythe combination of a strain inducing liner 152 atop the FET 151 andstrain inducing wells 153 adjacent to the FET 151. The strain inducingliner 152 and strain inducing wells 153 may be processed to induce atensile strain on the device channel 12 of the relaxed semiconductingsurface 85, as described above with reference to FIG. 6, or to induce acompressive strain on the device channel 12 of the relaxedsemiconducting surface 85, as described above with reference to FIG. 7.

The uniaxial strain in the biaxially strained substrate region 160 isprovided by the combination of a strain inducing layer 155 underlyingthe device channel 12 with a strain inducing liner 161 and/or straininducing wells 154. The strain inducing layer 155 within the biaxiallystrained substrate region 160 may comprise silicon doped with carbon(Si:C) or silicon germanium doped with carbon (SiGe:C) and provide acompressive biaxially strained semiconducting surface, as describedabove with reference to FIG. 3, or silicon germanium (SiGe) and providea tensile biaxially strained semiconducting surface, as described abovewith reference to FIGS. 1 and 2. Isolation regions 170 comprisingintrinsically tensile strained or intrinsically compressively straineddielectric fill can increase the biaxial strain produced within thebiaxially strained substrate region 160.

The strain inducing wells 154 within the biaxially strained substrateregion 160 may comprise silicon germanium (SiGe), hence providing acompressive uniaxial strain to the device channel 12 of the biaxiallystrained substrate region 160, as described above with reference toFIGS. 2 and 3. The strain inducing wells 154 may also comprise silicondoped with carbon (Si:C) or silicon germanium doped with carbon(SiGe:C), hence providing a tensile uniaxial strain to the devicechannel 12 of the biaxially strained substrate region 160, as describedabove with reference to FIG. 1. The strain inducing liner 161 may beformed atop the FET 149 in the biaxially strained substrate region 160to provide a tensile or compressive uniaxial strain to the devicechannel 12 of the biaxially strained substrate region 160, as describedabove with reference to FIGS. 1-3.

The CMOS structure depicted in FIG. 8 may be formed using a methodsimilar to the method used for providing the CMOS structure depicted inFIG. 7, with the exception that a strain inducing layer is not presentin the relaxed substrate region 150. Alternatively, a strain inducinglayer may be present in the relaxed substrate region 150 so long as thesemiconducting surface overlying the strain inducing layer is grown to athickness greater than its' critical thickness.

The following examples have been provided to further illustrate thepresent invention and to demonstrate some advantages that can arisetherefrom. The examples have been provided for illustrative purposesonly and therefore the present invention should not be limited to theexamples depicted below.

Example 1 Formation of Compressive or Tensile Dielectric Capping LayerAtop Biaxially Strained SGOI Substrate

In this example, a dielectric capping layer (compressive or tensilestrain inducing layer) was used to enhance the drive current byintroducing a uniaxial strain along the FET channel. When such adielectric capping layer is deposited over an SGOI FET, the latticestructure was distorted in response to the combination of a biaxialtensile strain and a smaller uniaxial tensile or compressive stress.FIG. 9( a) depicts a schematic description of biaxial tension strainedSi, in which the longitudinal lattice dimension (x-direction, parallelto the channel) was equal to the transverse lattice dimension(y-direction, in the same plane and perpendicular to the device channel)and the normal lattice dimension (z-direction, out of the channelplane). FIG. 9( b) depicts the lattice symmetry of the biaxial tensionstrained Si substrate depicted in FIG. 9( a) with a superimposeduniaxial tensile strain along the channel resulting in a largerlongitudinal lattice dimension than the transverse lattice dimension andthe normal lattice dimension. FIG. 9( c) depicts the lattice symmetry ofthe biaxial tension strained Si substrate depicted in FIG. 9( a) with asuperimposed uniaxial compressive strain along the channel resulting ina larger transverse lattice dimension than the longitudinal latticedimension and the normal lattice dimension.

Devices were fabricated with stress inducing dielectric capping layers(strain inducing liners) on 300 mm diameter thermally mixed ultra-thinSGOI substrates. The substrates displayed excellent uniformity in Gemole fraction [Ge] and thickness across the wafer (Std. Dev of [Ge] was0.18% across the 300 mm diameter substrate and the Std. Dev of thesubstrate thickness was 0.85 nm across the 300 mm diameter substrate).FETs (n-type and p-type) were provided on the substrates having a 55 nmchannel length. Tensile or compressive dielectric capping layers (straininducing liners) were then formed atop the FETs.

FIG. 10 depicts I_(on) v. I_(off) measurements for nFET devices 200having tensile longitudinal strain (parallel to the device channel),super-imposed by a tensile strain inducing dielectric capping layer, andnFET devices 250 having a compressive longitudinal strain (parallel tothe device channel), super imposed by a compressive strain inducingdielectric capping layer. A power supply voltage of 1.0 V was applied tothe nFET devices provided the I_(on) v. I_(off) data depicted in FIG.10. Uniaxial tension further enhanced current drive of strained Si nFETdevices. FIG. 10 depicts that an SGOI nFET can obtain approximately a10% enhancement in drive current with a change of the dielectric cappinglayer from a compressive strain inducing dielectric capping layer to atensile strain inducing dielectric capping layer.

Referring to FIG. 1, I_(on) v. I_(off) was then measured for pFETdevices 300 having tensile longitudinal strain (parallel to the devicechannel), super-imposed by a tensile strain inducing dielectric cappinglayer, and pFET devices 350 having a compressive longitudinal strain(parallel to the device channel), super-imposed by a compressive straininducing dielectric capping layer. A power supply voltage of 0.9 V wasapplied to the pFET devices providing the I_(on) v; I_(off) datadepicted in FIG. 11. Uniaxial compression further enhances current driveof strained Si pFET devices, FIG. 11 depicts that an SGOI pFET canobtain approximately a 5% enhancement in drive current with a change ofthe dielectric capping layer from a tensile strain inducing dielectriccapping layer to a compressive strain inducing dielectric capping layer.

While the present invention has been particularly shown and describedwith respect to preferred embodiments thereof it will be understood bythose skilled in the art that the foregoing and other changes in formsand details may be made without departing from the spirit and scope ofthe present invention. It is therefore intended that the presentinvention not be limited to the exact forms and details described andillustrated, but fall within the scope of the appended claims.

1. A method of providing a semiconducting structure comprising:providing a substrate having at least one strained semiconductingsurface, said at least one strained semiconducting surface having aninternal strain in a first direction and a second direction having equalmagnitude, wherein said first direction is within a same plane and isperpendicular to said second direction; producing at least onesemiconducting device atop said at least one strained semiconductingsurface, said at least one semiconducting device comprising a gateconductor atop a device channel portion of said semiconducting surface,said device channel separating source and drain regions; and forming astrain inducing liner atop said at least one gate region, wherein saidstrain inducing liner produces a uniaxial strain in a direction parallelto said device channel in said at least one semiconducting surface,wherein said magnitude of strain in said first direction is differentthan said second direction.
 2. The method of claim 1 wherein providingsaid substrate having said at least one strained semiconducting layercomprises providing a tensile strained epitaxially grown semiconductinglayer overlying a SiGe layer, said SiGe layer having Ge present in aconcentration ranging from about 5% to about 30%; and said straininducing liner comprises oxides, nitrides, doped oxides, or combinationsthereof deposited using chemical vapor deposition under conditions thatproduce a compressive stress or a tensile stress.
 3. The method of claim1 wherein providing said substrate having said at least one strainedsemiconducting layer comprises providing a compressively strainedepitaxially grown semiconducting layer overlying a silicon doped withcarbon layer, said silicon doped with carbon layer having carbon ispresent in a concentration ranging from about 0.5% to 6%; and saidstrain inducing liner comprises oxides, nitrides, doped oxides, orcombinations thereof deposited using chemical vapor deposition underconditions that produce a compressive stress or a tensile stress.
 4. Amethod of providing a semiconducting structure comprising: providing asubstrate having at least one strained semiconducting surface, said atleast one strained semiconducting surface having an internal strain in afirst direction and a second direction having equal magnitude, whereinsaid first direction is within a same plane and is perpendicular to saidsecond direction; producing at least one semiconducting device atop saidat least one strained semiconducting surface, said at least onesemiconducting device comprising a gate conductor atop a device channelportion of said semiconducting surface, said device channel separatingsource and drain regions; and forming strain inducing wells adjacentsaid at least one gate region, wherein said strain inducing wellsproduces a uniaxial strain in said at least one strained semiconductingsurface in a direction parallel to said device channel, wherein saidmagnitude of strain in said first direction is different than saidsecond direction.
 5. The method of claim 4 wherein forming said straininducing wells comprises etching a surface of said strained grownsemiconducting surface to provide a recess and epitaxially growing asilicon containing strain inducing material within said recess, whereinsilicon doped with carbon in a concentration ranging from about 0.5% to6% within said recess provides tensile strain inducing wells and silicongermanium wherein Ge present in a concentration ranging from about 5% toabout 50% within said recess provides compressive strain inducing wells.6. The method of claim 5 wherein forming said etching comprises an etchprocess including directional and non-directional etching, wherein saidrecess undercuts spacers adjacent said at least one gate region.
 7. Amethod of providing a semiconducting structure comprising: providing arelaxed substrate; producing at least one semiconducting device atopsaid relaxed substrate, said at least one semiconducting devicecomprising a gate conductor atop a device channel portion of saidsemiconducting surface, said device channel separating source and drainregions; forming strain inducing wells adjacent said device channel; andforming a strain inducing liner atop said at least one gate region,wherein said strain inducing liner and said strain inducing wellsprovide a uniaxial strain in said device channel.
 8. A method ofproviding a semiconducting structure comprising: providing a substratehaving a first device region and a second device region, producing atleast one semiconducting device atop a device channel portion of saidsubstrate in said first device region and said second device region; andproducing a uniaxial strain in said first device region and seconddevice, wherein said uniaxial strain is in a direction parallel to saiddevice channel of said first device region and said second deviceregion.
 9. The method of claim 8 wherein said uniaxial strain in saidfirst device region and said second device region is in tension or incompression, wherein said uniaxial strain in said first device region isthe same or different from said second device region.
 10. The method ofclaim 9 wherein producing a uniaxial strain in said first device regionand said second device region further comprises: processing said firstdevice region and said second device region to provide a combination ofstrain inducing structures comprising a first combination of a biaxiallystrained semiconducting surface underlying said at least onesemiconducting device and a strain inducing liner atop said at least onesemiconductor device, a second combination including said biaxiallystrained semiconducting surface underlying said at least onesemiconducting device and a strain inducing well adjacent said at leastone semiconducting device, a third combination including said biaxiallystrained semiconducting surface underlying said at least onesemiconducting device, strain inducing liner atop said at least onesemiconducting device, and strain inducing wells adjacent said at leastone semiconducting device or a fourth combination including a relaxedsubstrate underlying said at least one semiconducting device, saidstrain inducing liner atop said at least one semiconducting device on arelaxed surface and said strain inducing wells adjacent said at leastone semiconducting device, wherein said combination of strain inducingstructures in said first device region are identical to or differentfrom said combination of strain inducing structures in said seconddevice region.
 11. The method of claim 38 wherein said uniaxial strainin said first device region is in tension and comprises at least onenFET and said second device region is in compression and comprises atleast one pFET.